New Laser Micromachining System, equipped with Nanosecond pulse high quality, high power Lasers.Real monomode Laser sources with M^2 better than 1.3 (typical 1.1), wavelength of 355 nm, for enhanced interaction with electronic materials (semiconductors, ceramics, etc) and high focussing.High stability, high performance water cooled scanheads water stabilized, for fast and precise delivery of the laser beam.Very high performance stages with nanometer level repeatability and submicron accuracy for precise samples positioning or repositioning under scanner area.Mutiple cameras for quick and precise sample pattern recognition, and optional confocal instrumentation for nanometer level surface morphology reconstruction.Finaly, the possible configuration with equalized splitted beam to double scanhead allows to enhance system productivity.